EMO Hannover 2019, 16 - 21 September

    EMO Hannover 2019, 16 - 21 September
    Homepage>Exhibitors & Products >Motion Systems - METIS PLANAR PLATFORM

    Motion Systems - METIS PLANAR PLATFORM

    Logo Motion Systems - METIS PLANAR PLATFORM
    Logo Motion Systems - METIS PLANAR PLATFORM

    Product description

    This platform, Metis, is a hybrid planar mechanical/air bearing platform dedicated to step and scan applications. It is a 6 axes platform moving in X, Y, Z and Theta directions. Dynamic flatness over the full travel as well as bidirectional repeatability are key parameters. This platform is currently used in:
    - Wafer Process Control applications such as Critical Dimension and Thin film Metrology.
    - Wafer scribing
    - Wafer Laser Thermal Annealing

    It might also be used in Back End Of Line Lithography machines (mask aligners) and in some wafer dicing application.

    This platform features:
    - Flatness of motion given by the air bearing
    - Unlimited rotation in Theta
    - Double Z integration: Coarse travel for loading/unloading and fine travel for focus adjustement
    - Buit-in gravity compensator in Z (patent pending)
    - Yaw correction can be done by slightly shifting the Y1 and Y2 motors
    - Can be further integrated with an Active Isolation System fully controlled by ETEL
    - Travels in X and Y can be made longer with some limitations on the performance

    Main specifications
    - Total stroke: 320 mm for XY x 12 mm for Z
    - Speed: 1.2 m/s for XY, 0.1 m/s for Z and 15.7 rad/s for T
    - Acceleration: 1.2 g for XY, 0.2 g for Z and 104.7 rad/s2 for T
    - Position stability: ±25 nm for XY, ±15 nm for Z and ±0.2 arcsec for T
    - Bidirectional repeatability: ±0.4 µm for XY, ±0.3 µm for Z and ±2 arcsec for T

    Ask for the corresponding Integration Manual for more information.

    Product website

    Hall 9, Stand I32

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